High-temperature oxidation resistance of Ta-Si-N films with a high Si content

Research output: Contribution to journalArticleResearchpeer-review

Standard

High-temperature oxidation resistance of Ta-Si-N films with a high Si content. / Zeman, P.; Musil, J.; Daniel, R.
In: Surface & coatings technology, 2006.

Research output: Contribution to journalArticleResearchpeer-review

Bibtex - Download

@article{d9de84b5cec54883aba30f6e63a5e328,
title = "High-temperature oxidation resistance of Ta-Si-N films with a high Si content",
author = "P. Zeman and J. Musil and R. Daniel",
year = "2006",
doi = "10.1016/j.surfcoat.2005.02.097",
language = "English",
journal = "Surface & coatings technology",
issn = "0257-8972",
publisher = "Elsevier",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - High-temperature oxidation resistance of Ta-Si-N films with a high Si content

AU - Zeman, P.

AU - Musil, J.

AU - Daniel, R.

PY - 2006

Y1 - 2006

UR - http://www.scopus.com/inward/record.url?eid=2-s2.0-32644461597&partnerID=MN8TOARS

U2 - 10.1016/j.surfcoat.2005.02.097

DO - 10.1016/j.surfcoat.2005.02.097

M3 - Article

JO - Surface & coatings technology

JF - Surface & coatings technology

SN - 0257-8972

ER -