High-temperature oxidation resistance of Ta-Si-N films with a high Si content
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High-temperature oxidation resistance of Ta-Si-N films with a high Si content. / Zeman, P.; Musil, J.; Daniel, R.
In: Surface & coatings technology, 2006.
In: Surface & coatings technology, 2006.
Research output: Contribution to journal › Article › Research › peer-review
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Zeman P, Musil J, Daniel R. High-temperature oxidation resistance of Ta-Si-N films with a high Si content. Surface & coatings technology. 2006. doi: 10.1016/j.surfcoat.2005.02.097
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Bibtex - Download
@article{d9de84b5cec54883aba30f6e63a5e328,
title = "High-temperature oxidation resistance of Ta-Si-N films with a high Si content",
author = "P. Zeman and J. Musil and R. Daniel",
year = "2006",
doi = "10.1016/j.surfcoat.2005.02.097",
language = "English",
journal = "Surface & coatings technology",
issn = "0257-8972",
publisher = "Elsevier",
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - High-temperature oxidation resistance of Ta-Si-N films with a high Si content
AU - Zeman, P.
AU - Musil, J.
AU - Daniel, R.
PY - 2006
Y1 - 2006
UR - http://www.scopus.com/inward/record.url?eid=2-s2.0-32644461597&partnerID=MN8TOARS
U2 - 10.1016/j.surfcoat.2005.02.097
DO - 10.1016/j.surfcoat.2005.02.097
M3 - Article
JO - Surface & coatings technology
JF - Surface & coatings technology
SN - 0257-8972
ER -
