Correlation between fracture characteristics and valence electron concentration of sputtered Hf-C-N based thin films

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Correlation between fracture characteristics and valence electron concentration of sputtered Hf-C-N based thin films. / Glechner, Thomas; Lang, S.; Hahn, R. et al.
In: Surface and Coatings Technology, Vol. 399.2020, No. 15 October, 126212, 19.07.2020.

Research output: Contribution to journal › Article › Research › peer-review

Harvard

Glechner, T, Lang, S, Hahn, R, Alfreider, M, Moraes, V, Primetzhofer, D, Ramm, J, Kolozsvári, S, Kiener, D & Riedl, H 2020, 'Correlation between fracture characteristics and valence electron concentration of sputtered Hf-C-N based thin films', Surface and Coatings Technology, vol. 399.2020, no. 15 October, 126212. https://doi.org/10.1016/j.surfcoat.2020.126212

APA

Glechner, T., Lang, S., Hahn, R., Alfreider, M., Moraes, V., Primetzhofer, D., Ramm, J., Kolozsvári, S., Kiener, D., & Riedl, H. (2020). Correlation between fracture characteristics and valence electron concentration of sputtered Hf-C-N based thin films. Surface and Coatings Technology, 399.2020(15 October), Article 126212. https://doi.org/10.1016/j.surfcoat.2020.126212

Vancouver

Glechner T, Lang S, Hahn R, Alfreider M, Moraes V, Primetzhofer D et al. Correlation between fracture characteristics and valence electron concentration of sputtered Hf-C-N based thin films. Surface and Coatings Technology. 2020 Jul 19;399.2020(15 October):126212. doi: 10.1016/j.surfcoat.2020.126212

Author

Glechner, Thomas ; Lang, S. ; Hahn, R. et al. / Correlation between fracture characteristics and valence electron concentration of sputtered Hf-C-N based thin films. In: Surface and Coatings Technology. 2020 ; Vol. 399.2020, No. 15 October.

Bibtex - Download

@article{51aa9e3ac46249a39b87764ad7fcc51d,
title = "Correlation between fracture characteristics and valence electron concentration of sputtered Hf-C-N based thin films",
keywords = "Fracture resistance, Hf-C-N, Non-metal alloying, Thermal stability, Valence electron concentration",
author = "Thomas Glechner and S. Lang and R. Hahn and Markus Alfreider and Vincent Moraes and Daniel Primetzhofer and J{\"u}rgen Ramm and S. Kolozsv{\'a}ri and Daniel Kiener and Helmut Riedl",
year = "2020",
month = jul,
day = "19",
doi = "10.1016/j.surfcoat.2020.126212",
language = "English",
volume = "399.2020",
journal = "Surface and Coatings Technology",
issn = "0257-8972",
publisher = "Elsevier",
number = "15 October",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Correlation between fracture characteristics and valence electron concentration of sputtered Hf-C-N based thin films

AU - Glechner, Thomas

AU - Lang, S.

AU - Hahn, R.

AU - Alfreider, Markus

AU - Moraes, Vincent

AU - Primetzhofer, Daniel

AU - Ramm, Jürgen

AU - Kolozsvári, S.

AU - Kiener, Daniel

AU - Riedl, Helmut

PY - 2020/7/19

Y1 - 2020/7/19

KW - Fracture resistance

KW - Hf-C-N

KW - Non-metal alloying

KW - Thermal stability

KW - Valence electron concentration

UR - http://www.scopus.com/inward/record.url?scp=85088379248&partnerID=8YFLogxK

U2 - 10.1016/j.surfcoat.2020.126212

DO - 10.1016/j.surfcoat.2020.126212

M3 - Article

AN - SCOPUS:85088379248

VL - 399.2020

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

SN - 0257-8972

IS - 15 October

M1 - 126212

ER -

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