Combination of ab-initio and N-K, Ti-L2,3, V-L2,3 electron energy-loss near edge structure studies for TiN and VN films
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Translated title of the contribution | Combination of ab-initio and N-K, Ti-L2,3, V-L2,3 electron energy-loss near edge structure studies for TiN and VN films |
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Original language | English |
Pages (from-to) | 1060-1065 |
Journal | International journal of materials research : IJMR ; Zeitschrift für Metallkunde |
Volume | 98 |
Publication status | Published - 2007 |