Microelectronic engineering, ‎0167-9317

Journal

ISSNs0167-9317

Research output

  1. 2022
  2. Published

    Nanobeam electron diffraction strain mapping in monocrystalline silicon of modern trench power MOSFETs

    Karner, S., Blank, O., Rösch, M., Zalesak, J., Keckes, J. & Gammer, C., 2022, In: Microelectronic engineering. 264.2022, 15 August, 111870.

    Research output: Contribution to journalArticleResearchpeer-review

  3. 2017
  4. Published

    Accelerated thermo-mechanical fatigue of copper metallizations studied by pulsed laser heating

    Wurster, S., Bigl, S., Cordill, M. & Kiener, D., 5 Jan 2017, In: Microelectronic engineering. 167.2017, 5 January, p. 110-118 9 p.

    Research output: Contribution to journalArticleResearchpeer-review

  5. Published

    Influence of extreme thermal cycling on metal-polymer interfaces

    Putz, B., Völker, B., Semprimoschnig, C. & Cordill, M. J., 5 Jan 2017, In: Microelectronic engineering. 167.2017, 5 January, p. 17-22 6 p.

    Research output: Contribution to journalArticleResearchpeer-review

  6. 2016
  7. E-pub ahead of print

    Buckle induced delamination techniques to measure the adhesion of metal dielectric interfaces

    Kleinbichler, A., Zechner, J. & Cordill, M., 2 Nov 2016, (E-pub ahead of print) In: Microelectronic engineering. 167.2017, 5 January, p. 63-68 6 p.

    Research output: Contribution to journalArticleResearchpeer-review

  8. 2002
  9. Published

    Numerical simulations of magneto transport in dot array systems at high magnetic fields

    Oswald, J., Ochiai, Y., Aoki, N., Lin, LH., Ishibashi, K., Aoyagi, Y., Bird, J. P. & Ferry, D. K., 2002, In: Microelectronic engineering. p. 91-95

    Research output: Contribution to journalArticleResearchpeer-review

  10. 1999
  11. Published

    A Networkmodel for the Hall Insulator

    Oswald, J., Homer, A. & Ganitzer, P., 1999, In: Microelectronic engineering. 47, p. 31-33

    Research output: Contribution to journalArticleResearchpeer-review

  12. Published

    Separation of Universal and Non-Universal Scaling Regions in the IQHE

    Meisels, R., Kuchar, F., Belitsch, W. & Kramer, B., 1999, In: Microelectronic engineering. 47, p. 23-25

    Research output: Contribution to journalArticleResearchpeer-review