UV-reactive Monolayers of Aryl Esters on Oxidic Surfaces: Patterning and Chemical Surface Modification via Photo-Fries Rearrangment.
Publikationen: Konferenzbeitrag › Poster › Forschung › (peer-reviewed)
Standard
UV-reactive Monolayers of Aryl Esters on Oxidic Surfaces: Patterning and Chemical Surface Modification via Photo-Fries Rearrangment. / Höfler, Thomas; Basnar, B.; Cirac, J. et al.
2007. Postersitzung präsentiert bei Materials Research Society Fall Meeting 2007, Boston, Massachusetts, USA / Vereinigte Staaten.
2007. Postersitzung präsentiert bei Materials Research Society Fall Meeting 2007, Boston, Massachusetts, USA / Vereinigte Staaten.
Publikationen: Konferenzbeitrag › Poster › Forschung › (peer-reviewed)
Harvard
Höfler, T, Basnar, B, Cirac, J, Grießer, T, Hlawacek, G, Hoffmann, H, Shen, Q, Kovac, J, Ramsey, M, Satka, A, Teichert, C, Temmel, S, Track, A, Trimmel, G, Zojer, E & Kern, W 2007, 'UV-reactive Monolayers of Aryl Esters on Oxidic Surfaces: Patterning and Chemical Surface Modification via Photo-Fries Rearrangment.', Materials Research Society Fall Meeting 2007, Boston, USA / Vereinigte Staaten, 26/11/07 - 30/11/07.
APA
Höfler, T., Basnar, B., Cirac, J., Grießer, T., Hlawacek, G., Hoffmann, H., Shen, Q., Kovac, J., Ramsey, M., Satka, A., Teichert, C., Temmel, S., Track, A., Trimmel, G., Zojer, E., & Kern, W. (2007). UV-reactive Monolayers of Aryl Esters on Oxidic Surfaces: Patterning and Chemical Surface Modification via Photo-Fries Rearrangment.. Postersitzung präsentiert bei Materials Research Society Fall Meeting 2007, Boston, Massachusetts, USA / Vereinigte Staaten.
Vancouver
Höfler T, Basnar B, Cirac J, Grießer T, Hlawacek G, Hoffmann H et al.. UV-reactive Monolayers of Aryl Esters on Oxidic Surfaces: Patterning and Chemical Surface Modification via Photo-Fries Rearrangment.. 2007. Postersitzung präsentiert bei Materials Research Society Fall Meeting 2007, Boston, Massachusetts, USA / Vereinigte Staaten.
Author
Bibtex - Download
@conference{c0c3c4b57bb840128ef18d1f3148fe7c,
title = "UV-reactive Monolayers of Aryl Esters on Oxidic Surfaces: Patterning and Chemical Surface Modification via Photo-Fries Rearrangment.",
author = "Thomas H{\"o}fler and B. Basnar and J. Cirac and Thomas Grie{\ss}er and Gregor Hlawacek and Helmuth Hoffmann and Quan Shen and J. Kovac and Michael Ramsey and A. Satka and Christian Teichert and Susanne Temmel and Anna Track and Gregor Trimmel and Egbert Zojer and Wolfgang Kern",
year = "2007",
language = "Deutsch",
note = "Materials Research Society Fall Meeting 2007 ; Conference date: 26-11-2007 Through 30-11-2007",
}
RIS (suitable for import to EndNote) - Download
TY - CONF
T1 - UV-reactive Monolayers of Aryl Esters on Oxidic Surfaces: Patterning and Chemical Surface Modification via Photo-Fries Rearrangment.
AU - Höfler, Thomas
AU - Basnar, B.
AU - Cirac, J.
AU - Grießer, Thomas
AU - Hlawacek, Gregor
AU - Hoffmann, Helmuth
AU - Shen, Quan
AU - Kovac, J.
AU - Ramsey, Michael
AU - Satka, A.
AU - Teichert, Christian
AU - Temmel, Susanne
AU - Track, Anna
AU - Trimmel, Gregor
AU - Zojer, Egbert
AU - Kern, Wolfgang
PY - 2007
Y1 - 2007
M3 - Poster
T2 - Materials Research Society Fall Meeting 2007
Y2 - 26 November 2007 through 30 November 2007
ER -
