Toughness enhancement in TiN/Zr0.37Al0.63N1.09 multilayer films

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Toughness enhancement in TiN/Zr0.37Al0.63N1.09 multilayer films. / Lorentzon, Marcus; Meindlhumer, Michael; Palisaitis, Justinas et al.
in: Acta Materialia, Jahrgang 2024, Nr. 273, 119979, 04.05.2024.

Publikationen: Beitrag in FachzeitschriftArtikelForschung(peer-reviewed)

Harvard

Lorentzon, M, Meindlhumer, M, Palisaitis, J, Greczynski, G, Keckes, J, Rosen, J, Hultman, L, Birch, J & Ghafoor, N 2024, 'Toughness enhancement in TiN/Zr0.37Al0.63N1.09 multilayer films', Acta Materialia, Jg. 2024, Nr. 273, 119979. https://doi.org/10.1016/j.actamat.2024.119979

APA

Lorentzon, M., Meindlhumer, M., Palisaitis, J., Greczynski, G., Keckes, J., Rosen, J., Hultman, L., Birch, J., & Ghafoor, N. (2024). Toughness enhancement in TiN/Zr0.37Al0.63N1.09 multilayer films. Acta Materialia, 2024(273), Artikel 119979. https://doi.org/10.1016/j.actamat.2024.119979

Vancouver

Lorentzon M, Meindlhumer M, Palisaitis J, Greczynski G, Keckes J, Rosen J et al. Toughness enhancement in TiN/Zr0.37Al0.63N1.09 multilayer films. Acta Materialia. 2024 Mai 4;2024(273):119979. doi: 10.1016/j.actamat.2024.119979

Author

Lorentzon, Marcus ; Meindlhumer, Michael ; Palisaitis, Justinas et al. / Toughness enhancement in TiN/Zr0.37Al0.63N1.09 multilayer films. in: Acta Materialia. 2024 ; Jahrgang 2024, Nr. 273.

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@article{21a9d2c8378f43bda7578de1f95bf7e2,
title = "Toughness enhancement in TiN/Zr0.37Al0.63N1.09 multilayer films",
abstract = "The hardness and fracture toughness of high-temperature wear-resistant transition metal aluminum nitride multilayer films depend largely on the constituting layer{\textquoteright}s structure, compositional modulation, morphology, and interface coherency. We present a study on 1-micron thick multilayered films consisting of stacked layers of TiN and Zr0.37Al0.63N1.09, each layer being 10 nm thick. The films were grown using ion-assisted reactive magnetron sputtering on MgO(001) and Si(001) at substrate temperatures ranging from ambient to 900◦C. By increasing growth temperature, we found that the ZrAlN layers transition from near amorphous to nano- crystalline wurtzite to decomposed c-ZrN and w-AlN domains. Concurrently, the TiN layers exhibit strong fiber texture, polycrystallinity, and epitaxial growth carried by the ZrN domains. Both hardness and fracture stress, evaluated by nanoindentation and micromechanical tests, increase with temperature from H=24 GPaMgO, 23 GPaSi to 36 GPaMgO, 30 GPaSi, and σFSi= 6.1-7.7 GPa, respectively. An improved fracture toughness of KIC=2.4-2.8MPa√m is related to different toughening mechanisms for the various microstructures. The difference in hardness between the substrates is related to compressive stress due to the deposition conditions and thermal contraction. The superior fracture stress is attributed to dense multilayers, free from macroscopic defects due to ion-assisted growth. After being deposited at 200◦C, the multilayers remained thermally stable when vacuum annealed for 15 hours at 900◦C, with no significant change in phase composition or hardness. The improved hardness, toughness, and temperature stability of the otherwise brittle nitrides are promising for industrial applications.1.",
keywords = "Sputtering, Multilayers, STEM HAADF, Interface toughness, Micromechanics",
author = "Marcus Lorentzon and Michael Meindlhumer and Justinas Palisaitis and Grzegorz Greczynski and Jozef Keckes and Johanna Rosen and Lars Hultman and Jens Birch and Naureen Ghafoor",
year = "2024",
month = may,
day = "4",
doi = "10.1016/j.actamat.2024.119979",
language = "English",
volume = "2024",
journal = "Acta Materialia",
issn = "1359-6454",
publisher = "Elsevier",
number = "273",

}

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TY - JOUR

T1 - Toughness enhancement in TiN/Zr0.37Al0.63N1.09 multilayer films

AU - Lorentzon, Marcus

AU - Meindlhumer, Michael

AU - Palisaitis, Justinas

AU - Greczynski, Grzegorz

AU - Keckes, Jozef

AU - Rosen, Johanna

AU - Hultman, Lars

AU - Birch, Jens

AU - Ghafoor, Naureen

PY - 2024/5/4

Y1 - 2024/5/4

N2 - The hardness and fracture toughness of high-temperature wear-resistant transition metal aluminum nitride multilayer films depend largely on the constituting layer’s structure, compositional modulation, morphology, and interface coherency. We present a study on 1-micron thick multilayered films consisting of stacked layers of TiN and Zr0.37Al0.63N1.09, each layer being 10 nm thick. The films were grown using ion-assisted reactive magnetron sputtering on MgO(001) and Si(001) at substrate temperatures ranging from ambient to 900◦C. By increasing growth temperature, we found that the ZrAlN layers transition from near amorphous to nano- crystalline wurtzite to decomposed c-ZrN and w-AlN domains. Concurrently, the TiN layers exhibit strong fiber texture, polycrystallinity, and epitaxial growth carried by the ZrN domains. Both hardness and fracture stress, evaluated by nanoindentation and micromechanical tests, increase with temperature from H=24 GPaMgO, 23 GPaSi to 36 GPaMgO, 30 GPaSi, and σFSi= 6.1-7.7 GPa, respectively. An improved fracture toughness of KIC=2.4-2.8MPa√m is related to different toughening mechanisms for the various microstructures. The difference in hardness between the substrates is related to compressive stress due to the deposition conditions and thermal contraction. The superior fracture stress is attributed to dense multilayers, free from macroscopic defects due to ion-assisted growth. After being deposited at 200◦C, the multilayers remained thermally stable when vacuum annealed for 15 hours at 900◦C, with no significant change in phase composition or hardness. The improved hardness, toughness, and temperature stability of the otherwise brittle nitrides are promising for industrial applications.1.

AB - The hardness and fracture toughness of high-temperature wear-resistant transition metal aluminum nitride multilayer films depend largely on the constituting layer’s structure, compositional modulation, morphology, and interface coherency. We present a study on 1-micron thick multilayered films consisting of stacked layers of TiN and Zr0.37Al0.63N1.09, each layer being 10 nm thick. The films were grown using ion-assisted reactive magnetron sputtering on MgO(001) and Si(001) at substrate temperatures ranging from ambient to 900◦C. By increasing growth temperature, we found that the ZrAlN layers transition from near amorphous to nano- crystalline wurtzite to decomposed c-ZrN and w-AlN domains. Concurrently, the TiN layers exhibit strong fiber texture, polycrystallinity, and epitaxial growth carried by the ZrN domains. Both hardness and fracture stress, evaluated by nanoindentation and micromechanical tests, increase with temperature from H=24 GPaMgO, 23 GPaSi to 36 GPaMgO, 30 GPaSi, and σFSi= 6.1-7.7 GPa, respectively. An improved fracture toughness of KIC=2.4-2.8MPa√m is related to different toughening mechanisms for the various microstructures. The difference in hardness between the substrates is related to compressive stress due to the deposition conditions and thermal contraction. The superior fracture stress is attributed to dense multilayers, free from macroscopic defects due to ion-assisted growth. After being deposited at 200◦C, the multilayers remained thermally stable when vacuum annealed for 15 hours at 900◦C, with no significant change in phase composition or hardness. The improved hardness, toughness, and temperature stability of the otherwise brittle nitrides are promising for industrial applications.1.

KW - Sputtering

KW - Multilayers

KW - STEM HAADF

KW - Interface toughness

KW - Micromechanics

U2 - 10.1016/j.actamat.2024.119979

DO - 10.1016/j.actamat.2024.119979

M3 - Article

VL - 2024

JO - Acta Materialia

JF - Acta Materialia

SN - 1359-6454

IS - 273

M1 - 119979

ER -