TiN diffusion barrier failure by the formation of Cu3Si investigated by electron microscopy and atom probe tomography
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
Standard
TiN diffusion barrier failure by the formation of Cu3Si investigated by electron microscopy and atom probe tomography. / Mühlbacher, Marlene; Greczynski, Grzegorz; Sartory, Bernhard et al.
in: Journal of Vacuum Science and Technology B, JVSTB, Jahrgang 34.2016, Nr. 2, 022202, 19.02.2016, S. 1-8.
in: Journal of Vacuum Science and Technology B, JVSTB, Jahrgang 34.2016, Nr. 2, 022202, 19.02.2016, S. 1-8.
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
Harvard
Mühlbacher, M, Greczynski, G, Sartory, B, Mendez Martin, F, Schalk, N, Lu, J, Hultman, L & Mitterer, C 2016, 'TiN diffusion barrier failure by the formation of Cu3Si investigated by electron microscopy and atom probe tomography', Journal of Vacuum Science and Technology B, JVSTB, Jg. 34.2016, Nr. 2, 022202, S. 1-8. https://doi.org/10.1116/1.4942003
APA
Mühlbacher, M., Greczynski, G., Sartory, B., Mendez Martin, F., Schalk, N., Lu, J., Hultman, L., & Mitterer, C. (2016). TiN diffusion barrier failure by the formation of Cu3Si investigated by electron microscopy and atom probe tomography. Journal of Vacuum Science and Technology B, JVSTB, 34.2016(2), 1-8. Artikel 022202. https://doi.org/10.1116/1.4942003
Vancouver
Mühlbacher M, Greczynski G, Sartory B, Mendez Martin F, Schalk N, Lu J et al. TiN diffusion barrier failure by the formation of Cu3Si investigated by electron microscopy and atom probe tomography. Journal of Vacuum Science and Technology B, JVSTB. 2016 Feb 19;34.2016(2):1-8. 022202. doi: 10.1116/1.4942003
Author
Bibtex - Download
@article{e3b51d6372534cc7b02502f3ebc737a0,
title = "TiN diffusion barrier failure by the formation of Cu3Si investigated by electron microscopy and atom probe tomography",
author = "Marlene M{\"u}hlbacher and Grzegorz Greczynski and Bernhard Sartory and {Mendez Martin}, Francisca and Nina Schalk and Jun Lu and Lars Hultman and Christian Mitterer",
year = "2016",
month = feb,
day = "19",
doi = "10.1116/1.4942003",
language = "English",
volume = "34.2016",
pages = "1--8",
journal = "Journal of Vacuum Science and Technology B, JVSTB",
issn = "2166-2746",
publisher = "AVS Science and Technology Society",
number = "2",
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - TiN diffusion barrier failure by the formation of Cu3Si investigated by electron microscopy and atom probe tomography
AU - Mühlbacher, Marlene
AU - Greczynski, Grzegorz
AU - Sartory, Bernhard
AU - Mendez Martin, Francisca
AU - Schalk, Nina
AU - Lu, Jun
AU - Hultman, Lars
AU - Mitterer, Christian
PY - 2016/2/19
Y1 - 2016/2/19
U2 - 10.1116/1.4942003
DO - 10.1116/1.4942003
M3 - Article
VL - 34.2016
SP - 1
EP - 8
JO - Journal of Vacuum Science and Technology B, JVSTB
JF - Journal of Vacuum Science and Technology B, JVSTB
SN - 2166-2746
IS - 2
M1 - 022202
ER -
