Thermal emissivity of carbon coated p-doped silicon stencil masks for ion projection lithography
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
Standard
Thermal emissivity of carbon coated p-doped silicon stencil masks for ion projection lithography. / Braun, D.; Gajic, Rados; Kuchar, Friedemar et al.
in: Journal of vacuum science & technology / B (JVST), Jahrgang 21, 2003, S. 123-126.
in: Journal of vacuum science & technology / B (JVST), Jahrgang 21, 2003, S. 123-126.
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
Harvard
Braun, D, Gajic, R, Kuchar, F, Korntner, R, Haugeneder, E, Löschner, H, Butschke, J, Letzkus, F & Springer, R 2003, 'Thermal emissivity of carbon coated p-doped silicon stencil masks for ion projection lithography', Journal of vacuum science & technology / B (JVST), Jg. 21, S. 123-126.
APA
Braun, D., Gajic, R., Kuchar, F., Korntner, R., Haugeneder, E., Löschner, H., Butschke, J., Letzkus, F., & Springer, R. (2003). Thermal emissivity of carbon coated p-doped silicon stencil masks for ion projection lithography. Journal of vacuum science & technology / B (JVST), 21, 123-126.
Vancouver
Braun D, Gajic R, Kuchar F, Korntner R, Haugeneder E, Löschner H et al. Thermal emissivity of carbon coated p-doped silicon stencil masks for ion projection lithography. Journal of vacuum science & technology / B (JVST). 2003;21:123-126.
Author
Bibtex - Download
@article{ce767f5d599f48bd8f9572f1cbacfe1f,
title = "Thermal emissivity of carbon coated p-doped silicon stencil masks for ion projection lithography",
author = "D. Braun and Rados Gajic and Friedemar Kuchar and Regina Korntner and E. Haugeneder and H. L{\"o}schner and J. Butschke and F. Letzkus and R. Springer",
year = "2003",
language = "English",
volume = "21",
pages = "123--126",
journal = "Journal of vacuum science & technology / B (JVST)",
issn = "0734-211X",
publisher = "AVS Science and Technology Society",
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - Thermal emissivity of carbon coated p-doped silicon stencil masks for ion projection lithography
AU - Braun, D.
AU - Gajic, Rados
AU - Kuchar, Friedemar
AU - Korntner, Regina
AU - Haugeneder, E.
AU - Löschner, H.
AU - Butschke, J.
AU - Letzkus, F.
AU - Springer, R.
PY - 2003
Y1 - 2003
M3 - Article
VL - 21
SP - 123
EP - 126
JO - Journal of vacuum science & technology / B (JVST)
JF - Journal of vacuum science & technology / B (JVST)
SN - 0734-211X
ER -
