Temperature dependent growth morphologies of parahexaphenyl on SiO2 supported exfoliated graphene
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
Standard
Temperature dependent growth morphologies of parahexaphenyl on SiO2 supported exfoliated graphene. / Kratzer, Markus; Klima, Stefan; Teichert, Christian et al.
in: Journal of vacuum science & technology / B (JVST), Jahrgang 31, 2013, S. 04D114-1-04D114-7.
in: Journal of vacuum science & technology / B (JVST), Jahrgang 31, 2013, S. 04D114-1-04D114-7.
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
Harvard
Kratzer, M, Klima, S, Teichert, C, Gajić, R, Vasić, B, Matković, A & Ralevic, U 2013, 'Temperature dependent growth morphologies of parahexaphenyl on SiO2 supported exfoliated graphene', Journal of vacuum science & technology / B (JVST), Jg. 31, S. 04D114-1-04D114-7. https://doi.org/+10.1116/1.4813895
APA
Kratzer, M., Klima, S., Teichert, C., Gajić, R., Vasić, B., Matković, A., & Ralevic, U. (2013). Temperature dependent growth morphologies of parahexaphenyl on SiO2 supported exfoliated graphene. Journal of vacuum science & technology / B (JVST), 31, 04D114-1-04D114-7. https://doi.org/+10.1116/1.4813895
Vancouver
Kratzer M, Klima S, Teichert C, Gajić R, Vasić B, Matković A et al. Temperature dependent growth morphologies of parahexaphenyl on SiO2 supported exfoliated graphene. Journal of vacuum science & technology / B (JVST). 2013;31:04D114-1-04D114-7. doi: http://dx.doi.org/+10.1116/1.4813895
Author
Bibtex - Download
@article{1f2e392087714cb497167064932690c0,
title = "Temperature dependent growth morphologies of parahexaphenyl on SiO2 supported exfoliated graphene",
author = "Markus Kratzer and Stefan Klima and Christian Teichert and Rados Gaji{\'c} and Borislav Vasi{\'c} and Aleksandar Matkovi{\'c} and Uros Ralevic",
year = "2013",
doi = "http://dx.doi.org/+10.1116/1.4813895",
language = "English",
volume = "31",
pages = "04D114--1--04D114--7",
journal = "Journal of vacuum science & technology / B (JVST)",
issn = "0734-211X",
publisher = "AVS Science and Technology Society",
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - Temperature dependent growth morphologies of parahexaphenyl on SiO2 supported exfoliated graphene
AU - Kratzer, Markus
AU - Klima, Stefan
AU - Teichert, Christian
AU - Gajić, Rados
AU - Vasić, Borislav
AU - Matković, Aleksandar
AU - Ralevic, Uros
PY - 2013
Y1 - 2013
U2 - http://dx.doi.org/+10.1116/1.4813895
DO - http://dx.doi.org/+10.1116/1.4813895
M3 - Article
VL - 31
SP - 04D114-1-04D114-7
JO - Journal of vacuum science & technology / B (JVST)
JF - Journal of vacuum science & technology / B (JVST)
SN - 0734-211X
ER -
