Micromechanical Properties of Micro- and Nanocrystalline CVD Diamond Thin Films with Gradient Microstructures and Stresses
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
Autoren
Organisationseinheiten
Externe Organisationseinheiten
- Hochschule Augsburg
- European Synchrotron Radiation Facility
- Carbon Competence GmbH
Abstract
Chemical vapor deposition produced diamonds attract considerable scientific and industrial interest due to their exceptional mechanical and functional properties. Here, hot filament chemical vapour deposition was used to synthesize two diamond thin films with different cross-sectional microstructure and residual stresses. Structural characterization by scanning electron microscopy, Raman spectroscopy and cross-sectional synchrotron X-ray nanodiffraction revealed different diamond morphologies. While the microcrystalline diamond film exhibits pronounced microstructural gradients expressed by the gradually increasing (i) intensities of the 111 Debye-Scherrer rings, (ii) ⟨110⟩ fibre texture sharpness, (iii) grain size and (iv) a slightly oscillating residual stress at the level of -0.5 GPa, the nanocrystalline diamond film showed no pronounced cross-sectional variation of microstructure above the nucleation zone of ~0.5 µm and a steady stress level of 0.25 GPa. In situ micromechanical cantilever bending tests revealed highly different mechanical properties of the two films. In detail, Young’s modulus of 830±53 and 459±53 GPa, fracture stress of 12.4±0.8 and 7.8±1.0 GPa and fracture toughness values of 6.9±0.4 and 3.6±0.3 MPa·m0.5 were evaluated for the micro- and nanocrystalline diamond films, respectively. In summary, this study provides valuable insights into the microstructure-residual stress correlation in micro- and nanocrystalline diamond films, especially illuminating their influence on micromechanical properties.
Details
Originalsprache | Englisch |
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Aufsatznummer | 023401 |
Seitenumfang | 12 |
Fachzeitschrift | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films |
Jahrgang | 42.2024 |
Ausgabenummer | 2 |
DOIs | |
Status | Veröffentlicht - 12 Jan. 2024 |