Interfacial Band Engineering of MoS2/Gold Interfaces Using Pyrimidine-Containing Self-Assembled Monolayers: Toward Contact-Resistance-Free Bottom-Contacts
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in: Advanced Electronic Materials, Jahrgang 6, Nr. 5, 2000110, 18.03.2021.
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
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TY - JOUR
T1 - Interfacial Band Engineering of MoS2/Gold Interfaces Using Pyrimidine-Containing Self-Assembled Monolayers: Toward Contact-Resistance-Free Bottom-Contacts
AU - Matkovic, Aleksandar
AU - Petritz, Andreas
AU - Schider, Gerburg
AU - Krammer, Markus
AU - Kratzer, Markus
AU - Karner-Petritz, Esther
AU - Fian, Alexander
AU - Gold, Herbert
AU - Gärtner, Michael
AU - Terfort, Andreas
AU - Teichert, Christian
AU - Zojer, Egbert
AU - Zojer, Karin
AU - Stadlober, Barbara
N1 - Publisher Copyright: © 2020 The Authors. Published by WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
PY - 2021/3/18
Y1 - 2021/3/18
N2 - Bottom-contact architectures with common electrode materials such asgold are crucial for the integration of 2D semiconductors into existingdevice concepts. The high contact resistance to gold—especially for bottomcontacts—is, however, a general problem in 2D semiconductor thin-filmtransistors. Pyrimidine-containing self-assembled monolayers on goldelectrodes are investigated for tuning the electrode work functions in orderto minimize that contact resistance. Their frequently ignored asymmetric andbias-dependent nature is recorded by Kelvin probe force microscopy througha direct mapping of the potential drop across the channel during deviceoperation. A reduction of the contact resistances exceeding two orders ofmagnitude is achieved via a suitable self-assembled monolayer, which vastlyimproves the overall device performance.
AB - Bottom-contact architectures with common electrode materials such asgold are crucial for the integration of 2D semiconductors into existingdevice concepts. The high contact resistance to gold—especially for bottomcontacts—is, however, a general problem in 2D semiconductor thin-filmtransistors. Pyrimidine-containing self-assembled monolayers on goldelectrodes are investigated for tuning the electrode work functions in orderto minimize that contact resistance. Their frequently ignored asymmetric andbias-dependent nature is recorded by Kelvin probe force microscopy througha direct mapping of the potential drop across the channel during deviceoperation. A reduction of the contact resistances exceeding two orders ofmagnitude is achieved via a suitable self-assembled monolayer, which vastlyimproves the overall device performance.
KW - MoS
KW - Schottky barrier
KW - self-assembled monolayers
KW - thin-film transistors
KW - work-function engineering
KW - (2)
UR - http://www.scopus.com/inward/record.url?scp=85081952119&partnerID=8YFLogxK
U2 - 10.1002/aelm.202000110
DO - 10.1002/aelm.202000110
M3 - Article
VL - 6
JO - Advanced Electronic Materials
JF - Advanced Electronic Materials
SN - 2199-160X
IS - 5
M1 - 2000110
ER -
