Effects of bias pulse frequencies on reactively sputter deposited NbOx films
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
Standard
Effects of bias pulse frequencies on reactively sputter deposited NbOx films. / Lorenz, Roland; O`Sullivan, M.; Fian, Alexander et al.
in: Thin solid films, 2018, S. 335-342.
in: Thin solid films, 2018, S. 335-342.
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
Harvard
Lorenz, R, O`Sullivan, M, Fian, A, Sprenger, D, Lang, B & Mitterer, C 2018, 'Effects of bias pulse frequencies on reactively sputter deposited NbOx films', Thin solid films, S. 335-342. https://doi.org/10.1016/j.tsf.2018.06.040
APA
Lorenz, R., O`Sullivan, M., Fian, A., Sprenger, D., Lang, B., & Mitterer, C. (2018). Effects of bias pulse frequencies on reactively sputter deposited NbOx films. Thin solid films, 335-342. https://doi.org/10.1016/j.tsf.2018.06.040
Vancouver
Lorenz R, O`Sullivan M, Fian A, Sprenger D, Lang B, Mitterer C. Effects of bias pulse frequencies on reactively sputter deposited NbOx films. Thin solid films. 2018;335-342. doi: 10.1016/j.tsf.2018.06.040
Author
Bibtex - Download
@article{005e5a8de13746c28cba037a0881a7c1,
title = "Effects of bias pulse frequencies on reactively sputter deposited NbOx films",
author = "Roland Lorenz and M. O`Sullivan and Alexander Fian and D. Sprenger and Bernhard Lang and Christian Mitterer",
year = "2018",
doi = "10.1016/j.tsf.2018.06.040",
language = "English",
pages = "335--342",
journal = "Thin solid films",
issn = "0040-6090",
publisher = "Elsevier",
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - Effects of bias pulse frequencies on reactively sputter deposited NbOx films
AU - Lorenz, Roland
AU - O`Sullivan, M.
AU - Fian, Alexander
AU - Sprenger, D.
AU - Lang, Bernhard
AU - Mitterer, Christian
PY - 2018
Y1 - 2018
U2 - 10.1016/j.tsf.2018.06.040
DO - 10.1016/j.tsf.2018.06.040
M3 - Article
SP - 335
EP - 342
JO - Thin solid films
JF - Thin solid films
SN - 0040-6090
ER -
