Effects of bias pulse frequencies on reactively sputter deposited NbOx films

Publikationen: Beitrag in FachzeitschriftArtikelForschung(peer-reviewed)

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Effects of bias pulse frequencies on reactively sputter deposited NbOx films. / Lorenz, Roland; O`Sullivan, M.; Fian, Alexander et al.
in: Thin solid films, 2018, S. 335-342.

Publikationen: Beitrag in FachzeitschriftArtikelForschung(peer-reviewed)

Vancouver

Lorenz R, O`Sullivan M, Fian A, Sprenger D, Lang B, Mitterer C. Effects of bias pulse frequencies on reactively sputter deposited NbOx films. Thin solid films. 2018;335-342. doi: 10.1016/j.tsf.2018.06.040

Author

Lorenz, Roland ; O`Sullivan, M. ; Fian, Alexander et al. / Effects of bias pulse frequencies on reactively sputter deposited NbOx films. in: Thin solid films. 2018 ; S. 335-342.

Bibtex - Download

@article{005e5a8de13746c28cba037a0881a7c1,
title = "Effects of bias pulse frequencies on reactively sputter deposited NbOx films",
author = "Roland Lorenz and M. O`Sullivan and Alexander Fian and D. Sprenger and Bernhard Lang and Christian Mitterer",
year = "2018",
doi = "10.1016/j.tsf.2018.06.040",
language = "English",
pages = "335--342",
journal = "Thin solid films",
issn = "0040-6090",
publisher = "Elsevier",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Effects of bias pulse frequencies on reactively sputter deposited NbOx films

AU - Lorenz, Roland

AU - O`Sullivan, M.

AU - Fian, Alexander

AU - Sprenger, D.

AU - Lang, Bernhard

AU - Mitterer, Christian

PY - 2018

Y1 - 2018

U2 - 10.1016/j.tsf.2018.06.040

DO - 10.1016/j.tsf.2018.06.040

M3 - Article

SP - 335

EP - 342

JO - Thin solid films

JF - Thin solid films

SN - 0040-6090

ER -