Effect of growth conditions on interface stability and thermophysical properties of sputtered Cu films on Si with and without WTi barrier layers

Publikationen: Beitrag in FachzeitschriftArtikelForschung(peer-reviewed)

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@article{4d888197264c4fe899b2576e0c8a95a3,
title = "Effect of growth conditions on interface stability and thermophysical properties of sputtered Cu films on Si with and without WTi barrier layers",
author = "Imane Souli and Velislava Terziyska and Jozef Keckes and Werner Robl and Johannes Zechner and Christian Mitterer",
year = "2017",
month = feb,
day = "9",
doi = "10.1116/1.4975805",
language = "English",
volume = "35.2017",
journal = "Journal of vacuum science & technology / B (JVST)",
issn = "1071-1023",
publisher = "AVS Science and Technology Society",
number = "2",

}

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TY - JOUR

T1 - Effect of growth conditions on interface stability and thermophysical properties of sputtered Cu films on Si with and without WTi barrier layers

AU - Souli, Imane

AU - Terziyska, Velislava

AU - Keckes, Jozef

AU - Robl, Werner

AU - Zechner, Johannes

AU - Mitterer, Christian

PY - 2017/2/9

Y1 - 2017/2/9

U2 - 10.1116/1.4975805

DO - 10.1116/1.4975805

M3 - Article

VL - 35.2017

JO - Journal of vacuum science & technology / B (JVST)

JF - Journal of vacuum science & technology / B (JVST)

SN - 1071-1023

IS - 2

M1 - 022201

ER -