Diffusion and submonolayer growth of para-sexiphenyl on Ir(111) and Ir(111)-supported graphene

Publikationen: Beitrag in FachzeitschriftArtikelForschung(peer-reviewed)

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Diffusion and submonolayer growth of para-sexiphenyl on Ir(111) and Ir(111)-supported graphene. / Hlawacek, Gregor; Khokar, Fawad S.; van Gastel, Raoul et al.
in: IBM journal of research and development [Elektronische Ressource], Jahrgang 55, 2011, S. 15:1-15:7.

Publikationen: Beitrag in FachzeitschriftArtikelForschung(peer-reviewed)

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@article{21704c9db090444bbb4dfb30f7098ea1,
title = "Diffusion and submonolayer growth of para-sexiphenyl on Ir(111) and Ir(111)-supported graphene",
author = "Gregor Hlawacek and Khokar, {Fawad S.} and {van Gastel}, Raoul and Christian Teichert and Bene Poelsema",
year = "2011",
doi = "10.1147/JRD.2011.2160303",
language = "English",
volume = "55",
pages = "15:1--15:7",
journal = "IBM journal of research and development [Elektronische Ressource]",
issn = "0018-8646",
publisher = "IBM Corporation",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Diffusion and submonolayer growth of para-sexiphenyl on Ir(111) and Ir(111)-supported graphene

AU - Hlawacek, Gregor

AU - Khokar, Fawad S.

AU - van Gastel, Raoul

AU - Teichert, Christian

AU - Poelsema, Bene

PY - 2011

Y1 - 2011

U2 - 10.1147/JRD.2011.2160303

DO - 10.1147/JRD.2011.2160303

M3 - Article

VL - 55

SP - 15:1-15:7

JO - IBM journal of research and development [Elektronische Ressource]

JF - IBM journal of research and development [Elektronische Ressource]

SN - 0018-8646

ER -