Comparison of Magnetron Sputtering and Arc Evaporation by Al-Cr-N hard coatings
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TY - THES
T1 - Comparison of Magnetron Sputtering and Arc Evaporation by Al-Cr-N hard coatings
AU - Tritremmel, Christian
N1 - embargoed until null
PY - 2007
Y1 - 2007
N2 - Aluminium-Chromium-Nitride (Al-Cr-N) is a rather modern coating with increased oxidation resistance and high hardness. Economic considerations established arc-evaporation as the most common industrial synthesis route, due to its high degree of ionization and high deposition rates. But a main disadvantage of arc evaporation is the high droplet formation. Magnetron Sputtering in turn is droplet free but suffers from a much lower degree of ionization and lower deposition rates. This work gives a detailed comparison of these deposition techniques (under industrial conditions) by means of Al-Cr-N hard coatings. For the deposition of Al-Cr-N thin films different target compositions were used to investigate the metastable phase formation and transition. The investigations include the determination of various deposition parameters for comparable studies. The coating morphology was investigated by means of scanning electron microscopy (SEM) and roughness measurements (profilometry). X-ray diffraction (XRD) measurements with subsequent Rietveld refinement provided data on micro-structural changes such as phase fraction, crystallite size and lattice parameter. Mechanical properties such as hardness, E-moduli and residual stresses were determined by means of nanoindentation and biaxial-stress-temperature measurements (BSTM). Plasma measurements by planar probes were carried out to investigate the influence of ion bombardment on film growth and structure.
AB - Aluminium-Chromium-Nitride (Al-Cr-N) is a rather modern coating with increased oxidation resistance and high hardness. Economic considerations established arc-evaporation as the most common industrial synthesis route, due to its high degree of ionization and high deposition rates. But a main disadvantage of arc evaporation is the high droplet formation. Magnetron Sputtering in turn is droplet free but suffers from a much lower degree of ionization and lower deposition rates. This work gives a detailed comparison of these deposition techniques (under industrial conditions) by means of Al-Cr-N hard coatings. For the deposition of Al-Cr-N thin films different target compositions were used to investigate the metastable phase formation and transition. The investigations include the determination of various deposition parameters for comparable studies. The coating morphology was investigated by means of scanning electron microscopy (SEM) and roughness measurements (profilometry). X-ray diffraction (XRD) measurements with subsequent Rietveld refinement provided data on micro-structural changes such as phase fraction, crystallite size and lattice parameter. Mechanical properties such as hardness, E-moduli and residual stresses were determined by means of nanoindentation and biaxial-stress-temperature measurements (BSTM). Plasma measurements by planar probes were carried out to investigate the influence of ion bombardment on film growth and structure.
KW - Al-Cr-N
KW - hard coatings
KW - magnetron sputtering
KW - arc evaporation
KW - scanning electron microscopy
KW - SEM
KW - X-ray diffraction
KW - XRD
KW - biaxial-stress-temperature measurements
KW - BSTM
KW - Plasma measurements
KW - planar probes
KW - Al-Cr-N
KW - Hartstoffschichten
KW - Kathodenzerstäubung
KW - Lichtbogenverdampfung
KW - Rasterelektronenmikroskopie
KW - REM
KW - Röntgendiffraktometrie
KW - XRD
KW - Biaxiale Spannungs-Temperatur-Messung
KW - BSTM
KW - Plasmamessungen
KW - planare Sonden
M3 - Diploma Thesis
ER -