Antibacterial Silicon Oxide Thin Films Doped with Zinc and Copper Grown by Atmospheric Pressure Plasma Chemical Vapor Deposition

Publikationen: Beitrag in FachzeitschriftArtikelForschung(peer-reviewed)

Standard

Antibacterial Silicon Oxide Thin Films Doped with Zinc and Copper Grown by Atmospheric Pressure Plasma Chemical Vapor Deposition. / Jäger, Elisabeth; Schmidt, Jürgen; Pfuch, Andreas et al.
in: Nanomaterials, Jahrgang 9.2019, Nr. 2, 255, 02.2019, S. 1-14.

Publikationen: Beitrag in FachzeitschriftArtikelForschung(peer-reviewed)

Vancouver

Bibtex - Download

@article{766c374f790f494bb59e405b66ad301e,
title = "Antibacterial Silicon Oxide Thin Films Doped with Zinc and Copper Grown by Atmospheric Pressure Plasma Chemical Vapor Deposition",
abstract = "Zn-doped and Cu-doped SiO x films were synthesized by atmospheric pressure plasma chemical vapor deposition to study their antibacterial efficiency against Gram-negative Escherichia coli and their cytotoxic effect on the growth of mouse cells. Zn-rich and Cu-rich particles with diameters up to several microns were found to be homogeneously distributed within the SiO x films. For both doping elements, bacteria are killed within the first three hours after exposure to the film surface. In contrast, mouse cells grow well on the surfaces of both film types, with a slight inhibition present only after the first day of exposure. The obtained results indicate that the films show a high potential for use as effective antibacterial surfaces for medical applications. ",
author = "Elisabeth J{\"a}ger and J{\"u}rgen Schmidt and Andreas Pfuch and Sebastian Spange and Oliver Beier and Nikolaus J{\"a}ger and Oliver Jantschner and Rostislav Daniel and Christian Mitterer",
year = "2019",
month = feb,
doi = "10.3390/nano9020255",
language = "English",
volume = "9.2019",
pages = "1--14",
journal = "Nanomaterials",
issn = "2079-4991",
publisher = "Multidisciplinary Digital Publishing Institute (MDPI)",
number = "2",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Antibacterial Silicon Oxide Thin Films Doped with Zinc and Copper Grown by Atmospheric Pressure Plasma Chemical Vapor Deposition

AU - Jäger, Elisabeth

AU - Schmidt, Jürgen

AU - Pfuch, Andreas

AU - Spange, Sebastian

AU - Beier, Oliver

AU - Jäger, Nikolaus

AU - Jantschner, Oliver

AU - Daniel, Rostislav

AU - Mitterer, Christian

PY - 2019/2

Y1 - 2019/2

N2 - Zn-doped and Cu-doped SiO x films were synthesized by atmospheric pressure plasma chemical vapor deposition to study their antibacterial efficiency against Gram-negative Escherichia coli and their cytotoxic effect on the growth of mouse cells. Zn-rich and Cu-rich particles with diameters up to several microns were found to be homogeneously distributed within the SiO x films. For both doping elements, bacteria are killed within the first three hours after exposure to the film surface. In contrast, mouse cells grow well on the surfaces of both film types, with a slight inhibition present only after the first day of exposure. The obtained results indicate that the films show a high potential for use as effective antibacterial surfaces for medical applications.

AB - Zn-doped and Cu-doped SiO x films were synthesized by atmospheric pressure plasma chemical vapor deposition to study their antibacterial efficiency against Gram-negative Escherichia coli and their cytotoxic effect on the growth of mouse cells. Zn-rich and Cu-rich particles with diameters up to several microns were found to be homogeneously distributed within the SiO x films. For both doping elements, bacteria are killed within the first three hours after exposure to the film surface. In contrast, mouse cells grow well on the surfaces of both film types, with a slight inhibition present only after the first day of exposure. The obtained results indicate that the films show a high potential for use as effective antibacterial surfaces for medical applications.

UR - http://www.scopus.com/inward/record.url?scp=85062570873&partnerID=8YFLogxK

U2 - 10.3390/nano9020255

DO - 10.3390/nano9020255

M3 - Article

VL - 9.2019

SP - 1

EP - 14

JO - Nanomaterials

JF - Nanomaterials

SN - 2079-4991

IS - 2

M1 - 255

ER -