30 nm X-ray focusing correlates oscillatory stress, texture and structural defect gradients across multilayered Ti N-SiOx thin film

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30 nm X-ray focusing correlates oscillatory stress, texture and structural defect gradients across multilayered Ti N-SiOx thin film. / Keckes, Jozef; Daniel, Rostislav; Todt, Juraj et al.
in: Acta materialia, Jahrgang 144, 2018, S. 862-873.

Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)

Harvard

Keckes, J, Daniel, R, Todt, J, Zalesak, J, Sartory, B, Braun, S, Gluch, J, Rosenthal, M, Burghammer, MC, Mitterer, C, Niese, S & Kubec, A 2018, '30 nm X-ray focusing correlates oscillatory stress, texture and structural defect gradients across multilayered Ti N-SiOx thin film', Acta materialia, Jg. 144, S. 862-873. https://doi.org/10.1016/j.actamat.2017.11.049, https://doi.org/10.1016/j.actamat.2017.11.049

APA

Keckes, J., Daniel, R., Todt, J., Zalesak, J., Sartory, B., Braun, S., Gluch, J., Rosenthal, M., Burghammer, M. C., Mitterer, C., Niese, S., & Kubec, A. (2018). 30 nm X-ray focusing correlates oscillatory stress, texture and structural defect gradients across multilayered Ti N-SiOx thin film. Acta materialia, 144, 862-873. https://doi.org/10.1016/j.actamat.2017.11.049, https://doi.org/10.1016/j.actamat.2017.11.049

Vancouver

Keckes J, Daniel R, Todt J, Zalesak J, Sartory B, Braun S et al. 30 nm X-ray focusing correlates oscillatory stress, texture and structural defect gradients across multilayered Ti N-SiOx thin film. Acta materialia. 2018;144:862-873. doi: 10.1016/j.actamat.2017.11.049, 10.1016/j.actamat.2017.11.049

Author

Keckes, Jozef ; Daniel, Rostislav ; Todt, Juraj et al. / 30 nm X-ray focusing correlates oscillatory stress, texture and structural defect gradients across multilayered Ti N-SiOx thin film. in: Acta materialia. 2018 ; Jahrgang 144. S. 862-873.

Bibtex - Download

@article{170a9b6027fb460c8a81065a1d6ada68,
title = "30 nm X-ray focusing correlates oscillatory stress, texture and structural defect gradients across multilayered Ti N-SiOx thin film",
author = "Jozef Keckes and Rostislav Daniel and Juraj Todt and Jakub Zalesak and Bernhard Sartory and S. Braun and J. Gluch and M. Rosenthal and Burghammer, {Manfred C.} and Christian Mitterer and S. Niese and A. Kubec",
year = "2018",
doi = "10.1016/j.actamat.2017.11.049",
language = "English",
volume = "144",
pages = "862--873",
journal = "Acta materialia",
issn = "1359-6454",
publisher = "Elsevier",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - 30 nm X-ray focusing correlates oscillatory stress, texture and structural defect gradients across multilayered Ti N-SiOx thin film

AU - Keckes, Jozef

AU - Daniel, Rostislav

AU - Todt, Juraj

AU - Zalesak, Jakub

AU - Sartory, Bernhard

AU - Braun, S.

AU - Gluch, J.

AU - Rosenthal, M.

AU - Burghammer, Manfred C.

AU - Mitterer, Christian

AU - Niese, S.

AU - Kubec, A.

PY - 2018

Y1 - 2018

UR - http://www.scopus.com/inward/record.url?eid=2-s2.0-85036475895&partnerID=MN8TOARS

U2 - 10.1016/j.actamat.2017.11.049

DO - 10.1016/j.actamat.2017.11.049

M3 - Article

VL - 144

SP - 862

EP - 873

JO - Acta materialia

JF - Acta materialia

SN - 1359-6454

ER -

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